Rolling mask nanolithography: the pathway to large area and low cost nanofabrication

Boris Kobrin; Edward S. Barnard; Mark L. Brongersma; Moon Kyu Kwak; L. Jay Guo

doi:10.1117/12.910158

8 February 2012 Rolling mask nanolithography: the pathway to large area and low cost nanofabrication

Boris Kobrin, Edward S. Barnard, Mark L. Brongersma, Moon Kyu Kwak, L. Jay Guo

Proceedings Volume 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V; 82490O (2012) https://doi.org/10.1117/12.910158
Event: SPIE MOEMS-MEMS, 2012, San Francisco, California, United States

Abstract

The demand for large area and low cost nanopatterning techniques for optical coatings and photonic devices has increased at a tremendous rate. At present, it is clear that currently available nanopatterning technologies are unable to meet the required performance, fabrication-speed, or cost criteria for many applications requiring large area and low cost nanopatterning. Rolith Inc proposes to use a new nanolithography method - "Rolling mask" lithography - that combines the best features of photolithography, soft lithography and roll-to-plate printing technologies. We will report on the first results achieved on a recently built prototype tool and cylindrical mask, which was designed to pattern 300 mm wide substrate areas.

Citation Download Citation

Boris Kobrin, Edward S. Barnard, Mark L. Brongersma, Moon Kyu Kwak, and L. Jay Guo "Rolling mask nanolithography: the pathway to large area and low cost nanofabrication", Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82490O (8 February 2012); https://doi.org/10.1117/12.910158

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