HSQ resist for replication stamp in polymers

M. R. Saleem; P. A. Stenberg; M. B. Khan; Z. M. Khan; S. Honkanen; J. Turunen

doi:10.1117/12.907862

8 February 2012 HSQ resist for replication stamp in polymers

M. R. Saleem, P. A. Stenberg, M. B. Khan, Z. M. Khan, S. Honkanen, J. Turunen

Proceedings Volume 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V; 82490G (2012) https://doi.org/10.1117/12.907862
Event: SPIE MOEMS-MEMS, 2012, San Francisco, California, United States

Abstract

We investigated an affordable, accurate and large scale production method to fabricate sub-wavelength grating structures by replication in polycarbonate substrates by hot embossing. We used hydrogen silsesquioxane (HSQ) a high resolution, binary, inorganic, negative electron beam resist, on silicon substrate to make a stamp for replication. We fabricated the stamp on silicon by using HSQ-resist without any etching process with simple process steps. The process starts by depositing an HSQ-resist layer on a silicon substrate and by a measurement of the desired film thickness by adjusting the spinning speed and time. The resist material is then subjected to e-beam writing followed by a heat treatment to enhance the hardness and to reveal properties analogous to solid SiO2 as a hot embossing stamp material. A comparison study is made with and without the etching process with different etching rates. We demonstrate that an effective and inexpensive stamp for thermal nano-imprint lithography (NIL) for optical gratings is provided without an etching process, which gives a uniform imprinting density over the entire grating surface and high imprint fidelity. The reflectance spectra of replicated grating structures are also shown to be in agreement with theoretical calculations.

Citation Download Citation

M. R. Saleem, P. A. Stenberg, M. B. Khan, Z. M. Khan, S. Honkanen, and J. Turunen "HSQ resist for replication stamp in polymers", Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82490G (8 February 2012); https://doi.org/10.1117/12.907862

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available