Elucidating the kinetics and mechanism of RAPID lithography

Michael P. Stocker; John T. Fourkas

doi:10.1117/12.912944

8 February 2012 Elucidating the kinetics and mechanism of RAPID lithography

Michael P. Stocker, John T. Fourkas

Proceedings Volume 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V; 824902 (2012) https://doi.org/10.1117/12.912944
Event: SPIE MOEMS-MEMS, 2012, San Francisco, California, United States

Abstract

Multiphoton absorption polymerization (MAP) is a powerful photolithographic technique that is capable of producing complex, three-dimensional structures. One key to improving the resolution of MAP is to employ photoinitiators that can be photodeactivated. This approach is known as resolution augmentation through photo-induced deactivation (RAPID). To enhance the efficiency and resolution of RAPID, it is necessary to develop a deeper understanding of the photochemistry of the molecules used to initiate polymerization. To study the nature of the active intermediate species capable of self-deactivation, here we present experiments in which the exposure and the timing of excitation and deactivation are varied for photopolymerization reactions occurring at a single location within a photoresist as well as experiments in which the dependence of feature size on fabrication velocity is determined.

Citation Download Citation

Michael P. Stocker and John T. Fourkas "Elucidating the kinetics and mechanism of RAPID lithography", Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 824902 (8 February 2012); https://doi.org/10.1117/12.912944

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