Paper
23 December 2011 Sub-nm-scale precision stage using nonresonant-ultrasonic motor for making of nanodevices
Y. Soh, K. Kosaka, H. Kubota
Author Affiliations +
Proceedings Volume 8204, Smart Nano-Micro Materials and Devices; 82043S (2011) https://doi.org/10.1117/12.903249
Event: SPIE Smart Nano + Micro Materials and Devices, 2011, Melbourne, Australia
Abstract
This paper is focused on piezoelectric actuator for precision stage system which has nano-scale resolution. Nanometer order positioning techniques are necessary for semiconductor manufacturing and its inspection. For these demands, we propose the nonresonant-ultrasonic motor(NRUSM) as driving source of positioning stage. One can use as the stage driving device in a SEM chamber, because NRUSM is non-magnetic device. In addition NRUSM is able to be made compact, can be equipped at various miniature tools, for instance, manipulation, pumping, probing systems, having nano scale resolution. NRUSM is also adopted to Reticle Free Exposure system which can make the flexible patterning by fine displacing of mask patterns. NRUSM's weak point is the occurrence of a wear because of friction caused by the ultrasonic motor. However this wear can be cut down by reducing the slipping. A previously proven effective solution, by which the driving keeps in the range of static friction without the slipping, results in long life time, high-durability and decrease of particles. We propose two solutions to reduce the slipping: driving method and change of structure. The former is control method using variable frequency instead of constant frequency. The latter is increase of friction tips because static frictional force is proportional to number of the tips.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Y. Soh, K. Kosaka, and H. Kubota "Sub-nm-scale precision stage using nonresonant-ultrasonic motor for making of nanodevices", Proc. SPIE 8204, Smart Nano-Micro Materials and Devices, 82043S (23 December 2011); https://doi.org/10.1117/12.903249
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KEYWORDS
Actuators

Ultrasonics

Neodymium

Particles

Semiconductor manufacturing

Inspection

Optical lithography

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