Third harmonic microscopy for optical material characterization

R. A. Weber; C. Rodriguez; D. N. Nguyen; L. A. Emmert; W. Rudolph; D. Patel; C. S. Menoni

doi:10.1117/12.899265

22 November 2011 Third harmonic microscopy for optical material characterization

R. A. Weber, C. Rodriguez, D. N. Nguyen, L. A. Emmert, W. Rudolph, D. Patel, C. S. Menoni

Proceedings Volume 8190, Laser-Induced Damage in Optical Materials: 2011; 81900V (2011) https://doi.org/10.1117/12.899265
Event: SPIE Laser Damage, 2011, Boulder, Colorado, United States

Abstract

Third harmonic (TH) imaging is inherently suited for optical material characterization. Under linearly polarized illumination the total TH signal is dominated by the signal resulting from material interfaces. For symmetry reasons, circularly polarized illumination of a medium with isotropic or cubic symmetry yields zero TH, and prevailing signals originate from localized anisotropic sample sites. Such anisotropy may result from laser induced stress, crystallinity, or birefringence. Pairing THG with complementary imaging techniques proves to be a useful diagnostic for investigating additional material characteristics. We report TH imaging of 10 nm colloidal gold nanoparticles, 100 mN nanoindentations, nascent film anisotropy, and laser induced material modification of HfO₂ films both pre- and post-laser damage.

Citation Download Citation

R. A. Weber, C. Rodriguez, D. N. Nguyen, L. A. Emmert, W. Rudolph, D. Patel, and C. S. Menoni "Third harmonic microscopy for optical material characterization", Proc. SPIE 8190, Laser-Induced Damage in Optical Materials: 2011, 81900V (22 November 2011); https://doi.org/10.1117/12.899265

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