Study on EUV photomask resist stripping and cleaning

Tsutomu Kikuchi; Yuji Nagashima; Haruka Nakano; Takahiko Wakatsuki; Kensuke Demura; Yoshiaki Kurokawa; Mikio Nonaka

doi:10.1117/12.899281

13 October 2011 Study on EUV photomask resist stripping and cleaning

Tsutomu Kikuchi, Yuji Nagashima, Haruka Nakano, Takahiko Wakatsuki, Kensuke Demura, Yoshiaki Kurokawa, Mikio Nonaka

Proceedings Volume 8166, Photomask Technology 2011; 81662Q (2011) https://doi.org/10.1117/12.899281
Event: SPIE Photomask Technology, 2011, Monterey, California, United States

Abstract

Any cleaning technology for state-of-the-art photo masks requires that pattern damage does not occur and optical characteristics do not change. Particularly with EUV masks, an important challenge is to suppress/prevent changes to the optical characteristics of ruthenium (Ru) film that generates when resist is removed (separated). This report illustrates a model explaining why optical characteristics change when conventional resist removal (separation) technologies are used on EUV mask. It also proposes a new resist removal technology that allows resist to be removed without any optical damage to Ru films.

Citation Download Citation

Tsutomu Kikuchi, Yuji Nagashima, Haruka Nakano, Takahiko Wakatsuki, Kensuke Demura, Yoshiaki Kurokawa, and Mikio Nonaka "Study on EUV photomask resist stripping and cleaning", Proc. SPIE 8166, Photomask Technology 2011, 81662Q (13 October 2011); https://doi.org/10.1117/12.899281

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