30nm full field quartz template replicated from Si master for FLASH active layer NIL

Duhyun Lee; Byung-Kyu Lee; Woong Ko; Jae-Kwan Kim; Kiyeon Yang; Byounghoon Seung; Ilyong Jang; Mun Ja Kim; Byunggook Kim; ChangMin Park; Jeongho Yeo; Changyoul Moon

doi:10.1117/12.898747

13 October 2011 30nm full field quartz template replicated from Si master for FLASH active layer NIL

Duhyun Lee, Byung-Kyu Lee, Woong Ko, Jae-Kwan Kim, Kiyeon Yang, Byounghoon Seung, Ilyong Jang, Mun Ja Kim, Byunggook Kim, ChangMin Park, Jeongho Yeo, Changyoul Moon

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Proceedings Volume 8166, Photomask Technology 2011; 81661U (2011) https://doi.org/10.1117/12.898747
Event: SPIE Photomask Technology, 2011, Monterey, California, United States

Abstract

38nm half pitch pattern was replicated from Si master pattern to quartz blank template. It is a novel approach different from typical quartz to quartz replication. This replication concept is expected to alleviate the burden not only in cost but also resolution for NIL template fabrication. In this study, full field Si master fabricated by ArF immersion lithography, UV-transparent hard mask for quartz blank template and core-out quartz blank template were applied to prove the concept. And the replica template was evaluated with NIL and subsequent etching.

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Duhyun Lee, Byung-Kyu Lee, Woong Ko, Jae-Kwan Kim, Kiyeon Yang, Byounghoon Seung, Ilyong Jang, Mun Ja Kim, Byunggook Kim, ChangMin Park, Jeongho Yeo, and Changyoul Moon "30nm full field quartz template replicated from Si master for FLASH active layer NIL", Proc. SPIE 8166, Photomask Technology 2011, 81661U (13 October 2011); https://doi.org/10.1117/12.898747

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