Paper
7 September 2011 Realizing metal and quantum dot containing patterns by two-photon lithography
Prem Prabhakaran, Yong Son, Kyung Kook Jang, Dong-Yol Yang, Kwang-Sup Lee
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Abstract
We summarize here studies aimed at incorporating silver nanoparticles or semiconductor nanoparticles (quantum dots) into polymeric microstructures. Two different approaches are followed in the case of silver nanoparticles and quantum dots (QDs). In case of silver a combination of photoreduction and thermal annealing are adapted. This combination is used to reduce a silver salt precursor to generate silver nanoparticles inside a photopolymerizable resin. Quantum dots were functionalized with photocrosslinkable ligands to enable their easy integration into a photopatternable resin.
© (2011) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Prem Prabhakaran, Yong Son, Kyung Kook Jang, Dong-Yol Yang, and Kwang-Sup Lee "Realizing metal and quantum dot containing patterns by two-photon lithography", Proc. SPIE 8113, Linear and Nonlinear Optics of Organic Materials XI, 81130B (7 September 2011); https://doi.org/10.1117/12.897002
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KEYWORDS
Nanoparticles

Silver

Quantum dots

Polymers

Particles

Confocal microscopy

Lithography

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