Low-loss dual-wave laser optics coatings at 1060 nm and 530 nm

Jue Wang; Horst Schreiber

doi:10.1117/12.883915

20 May 2011 Low-loss dual-wave laser optics coatings at 1060 nm and 530 nm

Jue Wang, Horst Schreiber

Proceedings Volume 8016, Window and Dome Technologies and Materials XII; 80160Y (2011) https://doi.org/10.1117/12.883915
Event: SPIE Defense, Security, and Sensing, 2011, Orlando, Florida, United States

Abstract

Red-to-green laser conversion requires dual-wave laser optics coatings at 1060nm and 530nm. Loss analysis of the dual-wave coatings were presented for 3 types of coating designs with a coating material combination of HfO₂/SiO₂. Homogeneity and smoothness of the HfO₂/SiO₂ multilayers via standard plasma ion assisted deposition were evaluated. A modified plasma ion assisted deposition process with in-situ plasma smoothing was developed to deposit dense and smooth HfO2/SiO2 multilayers. Improved film microstructure was revealed on single layer and multilayer coated samples by means of atomic force microscopy and scanning electron microscopy. The improved film microstructure led to low loss and laser durable coating performance.

Citation Download Citation

Jue Wang and Horst Schreiber "Low-loss dual-wave laser optics coatings at 1060 nm and 530 nm", Proc. SPIE 8016, Window and Dome Technologies and Materials XII, 80160Y (20 May 2011); https://doi.org/10.1117/12.883915

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