Development Of Optical Measurement And Control Systems For Photolithography

Gerald Bachur

doi:10.1117/12.954826

20 September 1976 Development Of Optical Measurement And Control Systems For Photolithography

Gerald Bachur

Proceedings Volume 0080, Developments in Semiconductor Microlithography; (1976) https://doi.org/10.1117/12.954826
Event: Developments in Semiconductor Microlithography, 1976, San Jose, CA, United States

Abstract

As the difficulties of producing more complicated integrated circuits increased, the pressures on process designers caused manufacturers of supporting technologies to develop the equipment necessary to generate reproducible product at reasonable yields. A group which proved highly successful in developing higher-performance equipment was in the optical measurement area. In fact, the generation of new measurement systems which were now highly reliable, repeatable, and traceable to NBS gave the device manufacturers a set of "measurement standards" which were rapidly accepted because of proven results. With the results being so positive, impetus was given toward the development of the optically-controlled systems needed to ensure highly-repeatable exposure cycles. A highly-significant advancement in process control, Constant Intensity, was developed. This system uses optical sensors to track the degradation of the source (in respect to specific photosensitive materials) and compensate for the wear by controlling power to the source, main-taining the desired intensity from exposure to exposure. The Constant Intensity capability took what was a variable (intensity and time), replacing them with fixed intensity and time.

Citation Download Citation

Gerald Bachur "Development Of Optical Measurement And Control Systems For Photolithography", Proc. SPIE 0080, Developments in Semiconductor Microlithography, (20 September 1976); https://doi.org/10.1117/12.954826

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