Multilayer optics and applications in EUV and x-ray region

Jingtao Zhu; Qiushi Huang; Haochuan Li; Yuchun Tu; Zhuqing Song; Lei Pan; Li Jiang; Xiaoqiang Wang; Fengli Wang; Zhong Zhang; Zhanshan Wang; Lingyan Chen

doi:10.1117/12.888275

18 February 2011 Multilayer optics and applications in EUV and x-ray region

Jingtao Zhu, Qiushi Huang, Haochuan Li, Yuchun Tu, Zhuqing Song, Lei Pan, Li Jiang, Xiaoqiang Wang, Fengli Wang, Zhong Zhang, Zhanshan Wang, Lingyan Chen

Author Affiliations +

Proceedings Volume 7995, Seventh International Conference on Thin Film Physics and Applications; 79952R (2011) https://doi.org/10.1117/12.888275
Event: Seventh International Conference on Thin Film Physics and Applications, 2010, Shanghai, China

Abstract

For extreme ultraviolet (EUV) radiation and soft X-rays, real part of the refractive indices of all materials are very close to unity, coupled with high absorption, makes the realization of high-reflective mirrors (just like visible and infrared light) impossible. Multilayer is a nano-structure, alternating of low- and high-Z materials in a periodic way, which can greatly enhance the reflectivity via the interference of light reflected from interfaces, like crystal optics. Reflective mirrors, polarization elements, monochromators, etc, can be made basing on multi-layer structures. Zone plate is a powerful tool to focus the light beam for EUV and soft X-ray into nanometer scale, which is produced by electron beam etching method. However, for hard X-ray, the zone plate will has smaller width of outmost layer and larger aspect ratio, which is difficult to realize. Multilayer Laue lens (MLL) is a promising method to overcome these limitations. MLL is a novel linear zone plate which is produced by depositing the depth-graded multilayer, according to the zone plate law reversely, on flat substrate and then slicing and polishing it to an ideal aspect ratio. In this paper, some recent development of multilayer optics for EUV and X-ray regions in IPOE will be introduced.

Citation Download Citation

Jingtao Zhu, Qiushi Huang, Haochuan Li, Yuchun Tu, Zhuqing Song, Lei Pan, Li Jiang, Xiaoqiang Wang, Fengli Wang, Zhong Zhang, Zhanshan Wang, and Lingyan Chen "Multilayer optics and applications in EUV and x-ray region", Proc. SPIE 7995, Seventh International Conference on Thin Film Physics and Applications, 79952R (18 February 2011); https://doi.org/10.1117/12.888275

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Mirrors

X-rays

Extreme ultraviolet

Multilayers

Zone plates

Reflectivity

X-ray optics

Show All Keywords

Keywords/Phrases

Search In:

Publication Years