A study of source mask optimization for logic device through experiment and simulations

Hyo-chan Kim; Jeong-Hoon Lee; Jong-Chan Shin; Yong-Kug Bae; Siyoung Choi; Ho-Kyu Kang

doi:10.1117/12.879429

5 April 2011 A study of source mask optimization for logic device through experiment and simulations

Hyo-chan Kim, Jeong-Hoon Lee, Jong-Chan Shin, Yong-Kug Bae, Siyoung Choi, Ho-Kyu Kang

Proceedings Volume 7973, Optical Microlithography XXIV; 79731E (2011) https://doi.org/10.1117/12.879429
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

Source and Mask co-Optimization (SMO) plays an increasingly important role in the advanced RETs required to continue shrinking designs in the low-k1 lithography regime. Instead of costly double pattering patterning techniques, SMO has been explored as an enabling technology for low-k1 design node. It is clear that intensive optimization of the fundamental degrees of freedom in the optical system allows for the creation of non-intuitive solutions in both the mask and the source, which leads to improved lithographic performance. In this work, source and mask shape for logic device have been optimized in order to improve process window of critical layouts which include complex 2D shape and dense contact. Tachyon SMO solution developed by BRION was introduced to obtain the optimization. In order to improve the accuracy of SMO model, AI blur which represents resist effect on wafer was considered during optimization. Based on simulation results, improvement in terms of process window as well as Mask Error Enhancement Factor (MEEF) was approximately 20 % in comparison with reference conditions. However, the corresponding experimental results should be investigated as the evidence of the performance SMO. These results demonstrate the importance of these considerations during optimization in achieving the best possible SMO results which can be applied successfully to the targeted lithography process.

Citation Download Citation

Hyo-chan Kim, Jeong-Hoon Lee, Jong-Chan Shin, Yong-Kug Bae, Siyoung Choi, and Ho-Kyu Kang "A study of source mask optimization for logic device through experiment and simulations", Proc. SPIE 7973, Optical Microlithography XXIV, 79731E (5 April 2011); https://doi.org/10.1117/12.879429

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available