High-performance intensity slope correction method for global process variability band improvement and printability enhancement in RET applications

Sergiy M. Komirenko

doi:10.1117/12.877594

22 March 2011 High-performance intensity slope correction method for global process variability band improvement and printability enhancement in RET applications

Sergiy M. Komirenko

Author Affiliations +

Proceedings Volume 7973, Optical Microlithography XXIV; 797318 (2011) https://doi.org/10.1117/12.877594
Event: SPIE Advanced Lithography, 2011, San Jose, California, United States

Abstract

A qualitatively new method applicable for process variability band (PVband) improvement and printability enhancement in resolution enhancement technique (RET) applications is reported. The method does not use costly simulations through the process window (PW). Instead, it utilizes a unique feedback mechanism derived from the intensity distribution information available during nominal optical proximity correction (OPC) simulation. Consequently, this Intensity Slope Correction (ISC) method provides superior performance as compared to traditional process window aware OPC tools. Preliminary results are presented. They suggest that this method can successfully be applied for improvement of integral PVband throughout the entire layout leading to global printability optimization.

Citation Download Citation

Sergiy M. Komirenko "High-performance intensity slope correction method for global process variability band improvement and printability enhancement in RET applications", Proc. SPIE 7973, Optical Microlithography XXIV, 797318 (22 March 2011); https://doi.org/10.1117/12.877594

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