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Thin films of two different dielectric materials (Yttrium Oxide and Tantalum Pentoxide) were deposited by reactive
sputtering and reactive evaporation to determine their suitability as a host for a rare earth doped planar waveguide
upconversion laser. The optical properties, structure and crystalline phase of the films were found to be dependent on
the deposition method and process parameters. X-ray diffraction (XRD) analysis on several of the 'as-deposited' thin
films revealed that the films vary from amorphous to highly crystalline depending on material and process parameters.
SEM imaging of the Yttrium Oxide layers revealed a regular column structure confirming their crystalline nature and
SEM imaging of the Tantalum Pentoxide layers revealed a smooth amorphous layer confirming their XRD
diffractrograms. The dielectric thin film layers which allowed guiding in both the visible and infra-red regions of the
spectrum had a more amorphous structure.
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S. J. Pearce, M. D. B. Charlton, G. J. Parker, J. S. Wilkinson, "Structural and optical properties of different dielectric thin films for planar waveguiding applications," Proc. SPIE 7934, Optical Components and Materials VIII, 79341N (23 February 2011); https://doi.org/10.1117/12.883224