Atomic layer deposition of amorphous TiO[sub]2[/sub]/ZnO multilayers for soft x-ray coherent optics

Yasutaka Sanjo; Masaki Murata; Yuji Tanaka; Hiroshi Kumagai; Masaya Chigane

doi:10.1117/12.874397

21 February 2011 Atomic layer deposition of amorphous TiO₂/ZnO multilayers for soft x-ray coherent optics

Yasutaka Sanjo, Masaki Murata, Yuji Tanaka, Hiroshi Kumagai, Masaya Chigane

Proceedings Volume 7922, Synthesis and Photonics of Nanoscale Materials VIII; 79220L (2011) https://doi.org/10.1117/12.874397
Event: SPIE LASE, 2011, San Francisco, California, United States

Abstract

The development of high-reflection mirrors with amorphous metal-oxide multilayers in the "water-window"(λ=2.332nm-4.368nm) is desired for soft x-ray coherent optics. One of the authors has already studied and fabricated amorphous Al2O3/TiO2 multilayer for the "water-window" wavelengths by controlled growth with atomic layer deposition (ALD), and then acquired the reflectance of 33.4 % at 2.73nm and at the incidence angle of 18.2° from the normal incidence. In this study, we proposed Al₂O₃/TiO₂/Al₂O₃/ZnO multilayer mirrors. Al₂O₃ layers grown as amorphous layers were inserted between TiO₂ and ZnO layers. The Al₂O₃, ZnO and TiO₂ thin films were grown on Al2O3 (0001) substrate by controlled growth with atomic layer deposition (ALD) methods at 450°C. Experimental results indicated that the growth of crystalline rutile TiO₂ (100) and wurtzite ZnO (0001) were prevented. Thus, inserting amorphous Al₂O₃ layers, the results indicated that the crystalline growth was prevented. Moreover, we succeeded fabrication of amorphous TiO₂/ZnO mirrors by ALD.

Citation Download Citation

Yasutaka Sanjo, Masaki Murata, Yuji Tanaka, Hiroshi Kumagai, and Masaya Chigane "Atomic layer deposition of amorphous TiO₂/ZnO multilayers for soft x-ray coherent optics", Proc. SPIE 7922, Synthesis and Photonics of Nanoscale Materials VIII, 79220L (21 February 2011); https://doi.org/10.1117/12.874397

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