New measurement technology for CD and pattern profile variation using optical Fourier space

Fuminori Hayano; Akitoshi Kawai; Toshio Uchikawa; Kazumasa Endo; Kiminori Yoshino; Yuuichiro Yamazaki; Kuniharu Nagashima; Kenji Tsuchiya

doi:10.1117/12.846336

1 April 2010 New measurement technology for CD and pattern profile variation using optical Fourier space

Fuminori Hayano, Akitoshi Kawai, Toshio Uchikawa, Kazumasa Endo, Kiminori Yoshino, Yuuichiro Yamazaki, Kuniharu Nagashima, Kenji Tsuchiya

Author Affiliations +

Proceedings Volume 7638, Metrology, Inspection, and Process Control for Microlithography XXIV; 76380E (2010) https://doi.org/10.1117/12.846336
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

As well as measuring CD, monitoring pattern profile is becoming important for semiconductor metrology. Illuminating the wafer and detecting the reflective light, reflective light intensity in the Fourier space includes the information of CD and pattern profile variation by form birefringence effect. CD change and profile variation could be detected separately for the actual wafer. Mathematical simulation is presented the background of our unique approach. The detail results of CD and pattern profile monitor is shown in this paper.

Citation Download Citation

Fuminori Hayano, Akitoshi Kawai, Toshio Uchikawa, Kazumasa Endo, Kiminori Yoshino, Yuuichiro Yamazaki, Kuniharu Nagashima, and Kenji Tsuchiya "New measurement technology for CD and pattern profile variation using optical Fourier space", Proc. SPIE 7638, Metrology, Inspection, and Process Control for Microlithography XXIV, 76380E (1 April 2010); https://doi.org/10.1117/12.846336

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