Pupil polarimetry using stress-engineered optical elements

Amber M. Beckley; Thomas G. Brown

doi:10.1117/12.848970

24 February 2010 Pupil polarimetry using stress-engineered optical elements

Amber M. Beckley, Thomas G. Brown

Proceedings Volume 7570, Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XVII; 757011 (2010) https://doi.org/10.1117/12.848970
Event: SPIE BiOS, 2010, San Francisco, California, United States

Abstract

Stress-engineered optical elements show fascinating and potentially useful effects when placed at the pupil plane of an imaging system. When illuminated by a beam of spatially uniform polarization, a snapshot (single measurement) polarimetry method can be constructed. We expand upon this method to perform snapshot pupil polarimetry for spatially varying pupil polarization. We present the theory for snapshot non-uniform pupil polarization measurement using a stress-engineered optical element, as well as simulation results.

Citation Download Citation

Amber M. Beckley and Thomas G. Brown "Pupil polarimetry using stress-engineered optical elements", Proc. SPIE 7570, Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XVII, 757011 (24 February 2010); https://doi.org/10.1117/12.848970

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