Paper
20 November 2009 Optimization of pupil sampling scheme for aerial-image-based aberration measurement of projection optics in lithographic tools
Lijuan Wang, Shiyuan Liu, Wei Liu, Tingting Zhou
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Abstract
In this paper, the aberration measurement technique using aerial image sensor (AIS) is further discussed, and an approach to optimize the pupil sampling scheme for this technique is proposed. The accuracy of this technique heavily relies on the pupil sampling scheme as it has a significant impact on the random error propagation of the Zernike coefficients. We formulate the optimization problem using a continuous function and using the gradient information to search the solution space. We also employ the regularization framework using penalty functions to restrain the complexity of the sampling scheme. The simulation work has demonstrated that the pupil sampling scheme obtained by the proposed optimization approach are more suitable than those by the trial and error method.
© (2009) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Lijuan Wang, Shiyuan Liu, Wei Liu, and Tingting Zhou "Optimization of pupil sampling scheme for aerial-image-based aberration measurement of projection optics in lithographic tools", Proc. SPIE 7511, 2009 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Systems, 751106 (20 November 2009); https://doi.org/10.1117/12.837771
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Cited by 1 scholarly publication.
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KEYWORDS
Binary data

Image sensors

Lithography

Error analysis

Wavefront aberrations

Condition numbers

Artificial intelligence

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