Adaptive OPC approach based on image simulation

Qingwei Liu; Liguo Zhang

doi:10.1117/12.829393

23 September 2009 Adaptive OPC approach based on image simulation

Qingwei Liu, Liguo Zhang

Proceedings Volume 7488, Photomask Technology 2009; 748835 (2009) https://doi.org/10.1117/12.829393
Event: SPIE Photomask Technology, 2009, Monterey, California, United States

Abstract

With the design rule shrinks rapidly, full chip robust Optical Proximity Correction (OPC) will definitely need longer time due to the increasing pattern density. Furthermore, to achieve a perfect OPC control recipe becomes more difficult. For, the critical dimension of the design features is deeply sub exposure wavelength, and there is only limited room for the OPC correction. Usually very complicated fragment commands need to be developed to handle the shrinking designs, which can be infinitely complicated. So when you finished debug a sophisticated fragment scripts, you still cannot promise that the script is universal for all kinds of design. And when you find some hot spot after you apply OPC correction for certain design, the only thing you can do is to modify your fragmentation script and try to re-apply OPC on this design. But considering the increasing time that is needed for applying full chip OPC nowadays, re-apply OPC will definitely prolong the tape-out time. We here demonstrate an approach of adaptive OPC, with which automatic fragmentation adjustment can be realized. And this will be helpful to reduce the difficulty for OPC recipe development.

Citation Download Citation

Qingwei Liu and Liguo Zhang "Adaptive OPC approach based on image simulation", Proc. SPIE 7488, Photomask Technology 2009, 748835 (23 September 2009); https://doi.org/10.1117/12.829393

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