Aerial image based die-to-model inspections of advanced technology masks

Jun Kim; Wei-Guo Lei; Joan McCall; Suheil Zaatri; Michael Penn; Rajesh Nagpal; Lev Faivishevsky; Michael Ben-Yishai; Udy Danino; Aviram Tam; Oded Dassa; Vivek Balasubramanian; Tejas H. Shah; Mark Wagner; Shmoolik Mangan

doi:10.1117/12.829637

30 September 2009 Aerial image based die-to-model inspections of advanced technology masks

Jun Kim, Wei-Guo Lei, Joan McCall, Suheil Zaatri, Michael Penn, Rajesh Nagpal, Lev Faivishevsky, Michael Ben-Yishai, Udy Danino, Aviram Tam, Oded Dassa, Vivek Balasubramanian, Tejas H. Shah, Mark Wagner, Shmoolik Mangan

Author Affiliations +

Proceedings Volume 7488, Photomask Technology 2009; 748808 (2009) https://doi.org/10.1117/12.829637
Event: SPIE Photomask Technology, 2009, Monterey, California, United States

Abstract

Die-to-Model (D2M) inspection is an innovative approach to running inspection based on a mask design layout data. The D2M concept takes inspection from the traditional domain of mask pattern to the preferred domain of the wafer aerial image. To achieve this, D2M transforms the mask layout database into a resist plane aerial image, which in turn is compared to the aerial image of the mask, captured by the inspection optics. D2M detection algorithms work similarly to an Aerial D2D (die-to-die) inspection, but instead of comparing a die to another die it is compared to the aerial image model. D2M is used whenever D2D inspection is not practical (e.g., single die) or when a validation of mask conformity to design is needed, i.e., for printed pattern fidelity. D2M is of particular importance for inspection of logic single die masks, where no simplifying assumption of pattern periodicity may be done. The application can tailor the sensitivity to meet the needs at different locations, such as device area, scribe lines and periphery. In this paper we present first test results of the D2M mask inspection application at a mask shop. We describe the methodology of using D2M, and review the practical aspects of the D2M mask inspection.

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Jun Kim, Wei-Guo Lei, Joan McCall, Suheil Zaatri, Michael Penn, Rajesh Nagpal, Lev Faivishevsky, Michael Ben-Yishai, Udy Danino, Aviram Tam, Oded Dassa, Vivek Balasubramanian, Tejas H. Shah, Mark Wagner, and Shmoolik Mangan "Aerial image based die-to-model inspections of advanced technology masks", Proc. SPIE 7488, Photomask Technology 2009, 748808 (30 September 2009); https://doi.org/10.1117/12.829637

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