The NSLS-II multilayer Laue lens deposition system

Ray Conley; Nathalie Bouet; James Biancarosa; Qun Shen; Larry Boas; John Feraca; Leonard Rosenbaum

doi:10.1117/12.842076

8 September 2009 The NSLS-II multilayer Laue lens deposition system

Ray Conley, Nathalie Bouet, James Biancarosa, Qun Shen, Larry Boas, John Feraca, Leonard Rosenbaum

Proceedings Volume 7448, Advances in X-Ray/EUV Optics and Components IV; 74480U (2009) https://doi.org/10.1117/12.842076
Event: SPIE Optical Engineering + Applications, 2009, San Diego, California, United States

Abstract

The NSLS-II[1] program has a requirement for an unprecedented level of x-ray nanofocusing and has selected the wedged multilayer Laue lens[2,3] (MLL) as the optic of choice to meet this goal. In order to fabricate the MLL a deposition system capable of depositing depth-graded and laterally-graded multilayers with precise thickness control over many thousands of layers, with total film growth in one run up to 100μm thick or greater is required. This machine design expounds on the positive features of a rotary deposition system[4] constructed previously for MLLs and will contain multiple stationary, horizontally-oriented magnetron sources. A transport will move a substrate back and forth in a linear fashion over shaped apertures at well-defined velocities to affect a multilayer coating.

Citation Download Citation

Ray Conley, Nathalie Bouet, James Biancarosa, Qun Shen, Larry Boas, John Feraca, and Leonard Rosenbaum "The NSLS-II multilayer Laue lens deposition system", Proc. SPIE 7448, Advances in X-Ray/EUV Optics and Components IV, 74480U (8 September 2009); https://doi.org/10.1117/12.842076

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