Polarized optical scattering measurements of metallic nanoparticles upon a silicon wafer

Cheng-Yang Liu; Wei-En Fu

doi:10.1117/12.825716

17 June 2009 Polarized optical scattering measurements of metallic nanoparticles upon a silicon wafer

Cheng-Yang Liu, Wei-En Fu

Proceedings Volume 7389, Optical Measurement Systems for Industrial Inspection VI; 73892C (2009) https://doi.org/10.1117/12.825716
Event: SPIE Europe Optical Metrology, 2009, Munich, Germany

Abstract

Bidirectional ellipsometry has been developed as a technique for distinguishing among various scattering features near surfaces. The out-of-plane polarized light-scattering by metallic nanoparticles on wafer is calculated and measured. These calculations and measurements yield angular dependence of bidirectional ellipsometric parameters for out-ofplane scattering. The experimental data show good agreement with theoretical predictions for different diameter of gold spheres. The results suggest that improvements for accuracy are possible to perform measurements of scattering features from metallic nanoparticles. The polarization of light scattered by metallic nanoparticles can be used to determine the size of nano-particulate contaminants on silicon wafers.

Citation Download Citation

Cheng-Yang Liu and Wei-En Fu "Polarized optical scattering measurements of metallic nanoparticles upon a silicon wafer", Proc. SPIE 7389, Optical Measurement Systems for Industrial Inspection VI, 73892C (17 June 2009); https://doi.org/10.1117/12.825716

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