Optimal setting strategy for kernel-based OPC simulation engines

Katsuyoshi Kodera; Satoshi Tanaka; Toshiya Kotani; Soichi Inoue

doi:10.1117/12.814049

16 March 2009 Optimal setting strategy for kernel-based OPC simulation engines

Katsuyoshi Kodera, Satoshi Tanaka, Toshiya Kotani, Soichi Inoue

Proceedings Volume 7274, Optical Microlithography XXII; 727410 (2009) https://doi.org/10.1117/12.814049
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

We have studied the parameter setting dependence on the OPC TAT and OPC accuracy. We have found that we can save OPC TAT with sufficient accuracy by optimizing the optical diameter, fringe length, and the kernel counts in optical simulations of OPC. The optical diameter should be set to the optimal value depending on its mask design regularity. In the kernel-based optical simulations, the residual error is found to drop suddenly at the critical kernel count. This critical kernel count is found to be almost independent of the optical diameter, aberrations, and resist stack structures. On the other hand, it is clarified that the critical kernel count is strongly correlated with the coherence factor of the illuminations. Using this critical kernel count, we can obtain the image intensities with sufficient accuracy. We propose a method to determine fringe length by analyzing the characteristics of the optical kernels that are independent of the mask layouts.

Citation Download Citation

Katsuyoshi Kodera, Satoshi Tanaka, Toshiya Kotani, and Soichi Inoue "Optimal setting strategy for kernel-based OPC simulation engines", Proc. SPIE 7274, Optical Microlithography XXII, 727410 (16 March 2009); https://doi.org/10.1117/12.814049

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