Restoring pattern CD and cross-section using scatterometry: various approaches

S. Babin; L. Doskolovich; E. Kadomina; I. Kadomin; S. Volotovskiy

doi:10.1117/12.816436

23 March 2009 Restoring pattern CD and cross-section using scatterometry: various approaches

S. Babin, L. Doskolovich, E. Kadomina, I. Kadomin, S. Volotovskiy

Proceedings Volume 7272, Metrology, Inspection, and Process Control for Microlithography XXIII; 727243 (2009) https://doi.org/10.1117/12.816436
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

Scatterometry is one of the major methods used to measure linewidths and profiles of fabricated patterns. In scatterometry, light reflected from or transmitted through a periodic pattern is measured. The spectral signature of the pattern is compared to a library of signatures obtained using simulations; the crossection profile and linewidth are determined. The comparison method should be accurate and fast. On the other hand, the method should be able to work with relatively small libraries to shorten the creation of the library for specific types of patterns. This paper describes the evaluation of various approaches to such solutions. A direct comparison, a neural network, and a polynomial method were used. It was found that all these methods can provide good accuracy; while neural network and polynomial methods require considerably smaller libraries for stable and accurate extractions of CDs and the profile.

Citation Download Citation

S. Babin, L. Doskolovich, E. Kadomina, I. Kadomin, and S. Volotovskiy "Restoring pattern CD and cross-section using scatterometry: various approaches", Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 727243 (23 March 2009); https://doi.org/10.1117/12.816436

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