Optical characterization of photopolymer and photoresist materials for storage, sensing, and security applications

Timo Feid; Sven Frohmann; Jens Rass; Christian Müller; Susanna Orlic

doi:10.1117/12.797290

3 September 2008 Optical characterization of photopolymer and photoresist materials for storage, sensing, and security applications

Timo Feid, Sven Frohmann, Jens Rass, Christian Müller, Susanna Orlic

Author Affiliations +

Proceedings Volume 7053, Organic 3D Photonics Materials and Devices II; 705303 (2008) https://doi.org/10.1117/12.797290
Event: Photonic Devices + Applications, 2008, San Diego, California, United States

Abstract

Diffractive optical elements with application specific tailored properties can be fabricated by light induced alternation of the material's refractive index. Holographic polymers or photoresists are typically used for permanent optical structurization. Today, photostructurable media become core elements of photonic systems with innovative capabilities. We investigate different classes of organic photosensitive materials in order to optimize the interaction between the material and an optoelectronic system around. Some exemplary applications are microholographic data storage, 3D nano/micro structurization, optical patterning for advanced security features. Key issues include dynamic material response, spectral and temporal grating development, influence of the light intensity distribution, effects of pre-exposure and post-curing, etc. Materials under investigation are cationic and free radical polymerization systems, liquid crystalline polymer nanocomposites, and photoresist systems.

Citation Download Citation

Timo Feid, Sven Frohmann, Jens Rass, Christian Müller, and Susanna Orlic "Optical characterization of photopolymer and photoresist materials for storage, sensing, and security applications", Proc. SPIE 7053, Organic 3D Photonics Materials and Devices II, 705303 (3 September 2008); https://doi.org/10.1117/12.797290

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