Paper
14 May 2008 Development of diffractive antireflection structures on ZnSe for high power CO2 laser applications
Fabien Reversat, Thierry Berthou, Stéphane Tisserand, Lionel Dupuy, Sophie Gautier, Peter Muys, Danae Delbeke, David Grojo, Mohammed Laraichi, Philippe Delaporte
Author Affiliations +
Abstract
The unavoidable absorption of thin films used in antireflective coatings forms a permanent bottleneck in the development of optics for high power laser applications. A valid alternative would be the micro-structuring of the optics surface, realizing a diffraction grating which emulates the functioning of an Anti-Reflection thin film layer. Due to the absence of film material, this diffractive structure would not contribute to the overall absorption of the optics. This paper investigates the practical limits of this strategy, applied to zinc selenide as low absorption infrared substrate material.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fabien Reversat, Thierry Berthou, Stéphane Tisserand, Lionel Dupuy, Sophie Gautier, Peter Muys, Danae Delbeke, David Grojo, Mohammed Laraichi, and Philippe Delaporte "Development of diffractive antireflection structures on ZnSe for high power CO2 laser applications", Proc. SPIE 6992, Micro-Optics 2008, 69920I (14 May 2008); https://doi.org/10.1117/12.782633
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KEYWORDS
Etching

Absorption

Antireflective coatings

Plasma

Reactive ion etching

Photomasks

Carbon dioxide lasers

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