Characterization of (001)-orientated polycrystalline a-HgI2 films grown by hot wall physical vapor deposition

Yaoming Zheng; Weimin Shi; Guangpu Wei; Juan Qin; Sheng Chen; Linjun Wang; Yiben Xia

doi:10.1117/12.792375

11 March 2008 Characterization of (001)-orientated polycrystalline α-HgI₂ films grown by hot wall physical vapor deposition

Yaoming Zheng, Weimin Shi, Guangpu Wei, Juan Qin, Sheng Chen, Linjun Wang, Yiben Xia

Author Affiliations +

Proceedings Volume 6984, Sixth International Conference on Thin Film Physics and Applications; 69842X (2008) https://doi.org/10.1117/12.792375
Event: Sixth International Conference on Thin Film Physics and Applications, 2007, Shanghai, China

Abstract

The highly (001)-orientated α-HgI₂ film was deposited by hot wall physical vapor deposition (HWPVD) technology. The scanning electron microscopy (SEM), X-ray diffraction (XRD), dark current versus applied voltage and capacitance-frequency characteristics analysis showed that the film was compactly formed by separated columnar monocrystallines with uniform orientation along c-direction and with high resistivity (2.5×10¹²Ω•cm) and low dark current.

Citation Download Citation

Yaoming Zheng, Weimin Shi, Guangpu Wei, Juan Qin, Sheng Chen, Linjun Wang, and Yiben Xia "Characterization of (001)-orientated polycrystalline α-HgI₂ films grown by hot wall physical vapor deposition", Proc. SPIE 6984, Sixth International Conference on Thin Film Physics and Applications, 69842X (11 March 2008); https://doi.org/10.1117/12.792375

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