Understanding and application of constructive, destructive SRAF

Fook L. Chin; Todd P. Lukanc

doi:10.1117/12.773049

7 March 2008 Understanding and application of constructive, destructive SRAF

Fook L. Chin, Todd P. Lukanc

Proceedings Volume 6924, Optical Microlithography XXI; 69242V (2008) https://doi.org/10.1117/12.773049
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Acceptance of Sub Resolution Assist Feature (SRAF) has been widely recognized in lithography patterning. In general, with the insertion of SRAF in optically adjacent space area of design main feature, the aerial image intensity profiles of the corresponding main features are apparently being either constructively or destructively alternated at imaging plane [Figure 1]. From lithography patterning perspective, the optimized or better pattern imaging process requires constructive SRAF. Such SRAF is inserted into available space for main feature to obtain optimal or better image contrast, better imaging resolution and depth of focus (DOF) which is similar or close to optimal focus latitude. However, the complementary destructive SRAF insertion can adversely occur in certain circumstances. In this paper, we study the theoretical understanding of the constructive and destructive effects against design main features imaging associated with the efforts to include SRAF (it's either driven by rule, model or mishap). In addition, an evaluation scheme is developed and being explored in many aspects in order to describe the constructive and destructive response of inserted SRAF. Such evaluation scheme has derived an application to detect the degree of SRAF insertion coverage accuracy, impact on manufacturing, and most usefully, to access potential layout required optimization in design space based on these complementary effects mechanism throughout several off-axis illumination conditions. eature

Citation Download Citation

Fook L. Chin and Todd P. Lukanc "Understanding and application of constructive, destructive SRAF", Proc. SPIE 6924, Optical Microlithography XXI, 69242V (7 March 2008); https://doi.org/10.1117/12.773049

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