45nm node logic device OPE matching between exposure tools through laser bandwidth tuning

Kazuyuki Yoshimochi; Takao Tamura; Seiji Nagahara; Takayuki Uchiyama; Nigel Farrar; Toshihiro Oga; James Bonafede

doi:10.1117/12.771628

11 April 2008 45nm node logic device OPE matching between exposure tools through laser bandwidth tuning

Kazuyuki Yoshimochi, Takao Tamura, Seiji Nagahara, Takayuki Uchiyama, Nigel Farrar, Toshihiro Oga, James Bonafede

Proceedings Volume 6924, Optical Microlithography XXI; 69242K (2008) https://doi.org/10.1117/12.771628
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

For 45 nm Node logic devices, we have investigated the impact of laser bandwidth fluctuation on Optical Proximity Effect (OPE) by evaluating variation in through-pitch critical dimension (CD) performance. In addition, from these results we have calculated the Iso-Dense Bias (IDB), and determined the sensitivity to laser bandwidth fluctuation. These IDB results also enable us to present the laser bandwidth stability that is required to maintain a constant OPE. And finally, we introduce results from an investigation into OPE-matching between different generations of exposure tools, whereby in addition to laser bandwidth control, tilt-scan methodology was employed.

Citation Download Citation

Kazuyuki Yoshimochi, Takao Tamura, Seiji Nagahara, Takayuki Uchiyama, Nigel Farrar, Toshihiro Oga, and James Bonafede "45nm node logic device OPE matching between exposure tools through laser bandwidth tuning", Proc. SPIE 6924, Optical Microlithography XXI, 69242K (11 April 2008); https://doi.org/10.1117/12.771628

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