Paper
1 November 2007 Laser shockwave cleaning of EUV reticles
N. A. Lammers, A. Bleeker
Author Affiliations +
Abstract
Particles on the surface of the EUV reticle can cause serious imaging errors during exposure. Laser shockwave cleaning is a novel cleaning method, that shows great potential to remove these particles, without destroying the delicate surface of the reticle. In an effort to assess the cleaning performance of this method, a number of cleaning experiments were performed on wafers contaminated with glass spheres. These experiments showed that with the current setup, it was possible to remove particles as small as 500 nm from the surface of the wafer, at gap distances of 0.5 and 1.0 mm. Furthermore, the transient behaviour of the shockwave was studied with laser flash shadowgraphy. This showed that the shockwave is initially elliptical in shape, and that it can be described by the Taylor and Sedov solution for a point explosion.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
N. A. Lammers and A. Bleeker "Laser shockwave cleaning of EUV reticles", Proc. SPIE 6730, Photomask Technology 2007, 67304P (1 November 2007); https://doi.org/10.1117/12.746388
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CITATIONS
Cited by 4 scholarly publications and 1 patent.
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KEYWORDS
Particles

Reticles

Photons

Laser induced breakdown spectroscopy

Extreme ultraviolet

Pulsed laser operation

Ionization

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