A generic technique for reducing OPC iteration: fast forward OPC

Le Hong; John Sturtevant

doi:10.1117/12.746757

30 October 2007 A generic technique for reducing OPC iteration: fast forward OPC

Le Hong, John Sturtevant

Author Affiliations +

Proceedings Volume 6730, Photomask Technology 2007; 67302M (2007) https://doi.org/10.1117/12.746757
Event: SPIE Photomask Technology, 2007, Monterey, California, United States

Abstract

The drive toward advanced technology nodes has drastically increased the computational complexity of optical proximity correction (OPC). Applying full-chip OPC to all critical layers has become the most computational demanding step in the tape-out process. Tuning for fast and accurate OPC recipes is a critical step in the development of a total manufacturing solution. OPC is by design an iterative cycle, where one iteration is a single simulation and polygon fragmentation shift sequence. Typically an accurate OPC recipe requires eight or more iterations to converge to a final best solution. The number of iterations in a recipe directly impacts the full-chip OPC runtime. Engineers often find themselves spending hours tuning an OPC recipe to reduce just one iteration. This paper presents a generic technique called Fast Forward OPC (FFOPC). FFOPC will help to reduce any golden OPC recipe that meets certain requirements to a fixed 4 iterations with minimum accuracy lost. Most importantly this technique can be easily implemented as a plugin with any existing OPC tools.

Citation Download Citation

Le Hong and John Sturtevant "A generic technique for reducing OPC iteration: fast forward OPC", Proc. SPIE 6730, Photomask Technology 2007, 67302M (30 October 2007); https://doi.org/10.1117/12.746757

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