Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long x-ray mirror

Haruhiko Ohashi; Takashi Tsumura; Hiromi Okada; Hidekazu Mimura; Tatsuhiko Masunaga; Yasunori Senba; Shunji Goto; Kazuto Yamauchi; Tetsuya Ishikawa

doi:10.1117/12.733476

1 October 2007 Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long x-ray mirror

Haruhiko Ohashi, Takashi Tsumura, Hiromi Okada, Hidekazu Mimura, Tatsuhiko Masunaga, Yasunori Senba, Shunji Goto, Kazuto Yamauchi, Tetsuya Ishikawa

Author Affiliations +

Proceedings Volume 6704, Advances in Metrology for X-Ray and EUV Optics II; 670405 (2007) https://doi.org/10.1117/12.733476
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

A surface profiler system with a high accuracy of the order of nanometers has been developed for a half-meter-long X-ray mirror. This system is based on microstitching interferometer (MSI) and relative angle determinable stitching interferometer (RADSI). Using elastic hinges and linear actuators, we designed the 5-axis- and 6-axis stages for the MSI and RADSI, respectively, for the half-meter-long X-ray mirror. A test mirror of length 0.5 m was used to measure the height accuracy (1.4 nm in rms) and lateral resolution (36 μm) of the proposed system.

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Haruhiko Ohashi, Takashi Tsumura, Hiromi Okada, Hidekazu Mimura, Tatsuhiko Masunaga, Yasunori Senba, Shunji Goto, Kazuto Yamauchi, and Tetsuya Ishikawa "Microstitching interferometer and relative angle determinable stitching interferometer for half-meter-long x-ray mirror", Proc. SPIE 6704, Advances in Metrology for X-Ray and EUV Optics II, 670405 (1 October 2007); https://doi.org/10.1117/12.733476

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