Development of a precision dual level stage system for the dimensional metrology of large range surface topography

Jong-Ahn Kim; Jae Wan Kim; Tae Bong Eom; Chu-Shik Kang

doi:10.1117/12.732617

10 September 2007 Development of a precision dual level stage system for the dimensional metrology of large range surface topography

Jong-Ahn Kim, Jae Wan Kim, Tae Bong Eom, Chu-Shik Kang

Author Affiliations +

Proceedings Volume 6672, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III; 66720T (2007) https://doi.org/10.1117/12.732617
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

This paper presents the design and fabrication of a precision dual level stage composing a dimensional metrological system for large range surface topography, such as mask patterns for lithography, fine artifacts on a semi-conductor wafer and micro roughness on a large specular surface. The stage was configured as dual level, a fine stage on a coarse stage, to obtain large moving range and high resolution simultaneously. In the design of the coarse stage, we focused on a simple structure with low profile to achieve insensitivity to vibration and high accuracy. Therefore, a high quality flat surface plate was used as the reference plane of the coarse stage's movement, instead of a conventional simple stacking of two long stroke one-axis stages. The surface plate also has a role of metrological frame for very low thermal expansion coefficient and its size is 800 mm × 800 mm. The coarse stage is guided horizontally by a cross structure with two precision straight bars perpendicularly linked and vertically by the surface plate. The sliding pads made of PTFE are used to guarantee the smooth motion of the coarse stage for both horizontal and vertical directions. The fine stage fixed on the coarse stage generates five-axis fine motion, such as two-axis in-plane translation, one-axis in-plane and two-axis out-of-plane rotation. The fine stage is composed of flexure guided structures and actuated by five PZTs. The developed dual level stage can achieve a large range of 200 mm × 200 mm and a nanometric resolution simultaneously. Its movement is monitored and controlled using a five-axis laser interferometer system to be applied to a dimensional metrology having direct meter-traceability.

Citation Download Citation

Jong-Ahn Kim, Jae Wan Kim, Tae Bong Eom, and Chu-Shik Kang "Development of a precision dual level stage system for the dimensional metrology of large range surface topography", Proc. SPIE 6672, Advanced Characterization Techniques for Optics, Semiconductors, and Nanotechnologies III, 66720T (10 September 2007); https://doi.org/10.1117/12.732617

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available