Model-assisted routing for improved lithography robustness

Tim Kong; Hardy Leung; Vivek Raghavan; Alfred K. Wong; Sarah Xu

doi:10.1117/12.717055

21 March 2007 Model-assisted routing for improved lithography robustness

Tim Kong, Hardy Leung, Vivek Raghavan, Alfred K. Wong, Sarah Xu

Proceedings Volume 6521, Design for Manufacturability through Design-Process Integration; 65210D (2007) https://doi.org/10.1117/12.717055
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

This paper presents a model-assisted routing technique for improving lithography robustness of synthesized layouts. Presupposing an accurate lithography model and a model-based layout weak spot identification procedure, this method produces routed layout in-situ with acceptable turn around time. The approach starts with a conventionally routed layout that, although conforming to design rules, may contain undesirable layout configurations that the router should reconcile. Since weak spot identification is computation intensive, rule-based filtering is first applied to the incoming layout to select regions for further model-based analysis. The router then performs a non-discriminate correction to reduce the number of potential weak spots. This reduced set subsequently undergoes model-based weak spot analysis, distinguishing the actual weak spots. The router finally optimizes the layout to remove the identified weak spots. This technique has been implemented in an industry detail router, and tested with 65-nm technology. Experimental results show that this method can effectively remove actual weak spots with reasonable runtime.

Citation Download Citation

Tim Kong, Hardy Leung, Vivek Raghavan, Alfred K. Wong, and Sarah Xu "Model-assisted routing for improved lithography robustness", Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 65210D (21 March 2007); https://doi.org/10.1117/12.717055

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