Defects, overlay, and focus performance improvements with five generations of immersion exposure systems

Jan Mulkens; Bob Streefkerk; Hans Jasper; Jos de Klerk; Fred de Jong; Leon Levasier; Martijn Leenders

doi:10.1117/12.713577

19 March 2007 Defects, overlay, and focus performance improvements with five generations of immersion exposure systems

Jan Mulkens, Bob Streefkerk, Hans Jasper, Jos de Klerk, Fred de Jong, Leon Levasier, Martijn Leenders

Proceedings Volume 6520, Optical Microlithography XX; 652005 (2007) https://doi.org/10.1117/12.713577
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

This paper discusses the current performance and the evolution of five generations TWINSCAN immersion scanning exposure tools. It is shown that production worthy overlay and focus performance can be achieved at high scan speeds. The more critical part for immersion tools is related to defects, but also here improvements resulted in production worthy defect levels. In order to keep the defect level stable special measures are needed in the application of wafers. Especially Edge Bead Removal (EBR) design and wafer bevel cleanliness are important.

Citation Download Citation

Jan Mulkens, Bob Streefkerk, Hans Jasper, Jos de Klerk, Fred de Jong, Leon Levasier, and Martijn Leenders "Defects, overlay, and focus performance improvements with five generations of immersion exposure systems", Proc. SPIE 6520, Optical Microlithography XX, 652005 (19 March 2007); https://doi.org/10.1117/12.713577

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