Thin bilayer resists for 193-nm and future photolithography II

Yoshi Hishiro; Michael Hyatt

doi:10.1117/12.712737

23 March 2007 Thin bilayer resists for 193-nm and future photolithography II

Yoshi Hishiro, Michael Hyatt

Proceedings Volume 6519, Advances in Resist Materials and Processing Technology XXIV; 651935 (2007) https://doi.org/10.1117/12.712737
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Bilayer, Si-containing resists are a technique of interest and a strong candidate to replace chemical vapor deposition (CVD) hardmask processes for small critical dimensions (CDs). Previously, we proposed a very thin film approach using bilayer resists for future lithography, defined the requirements for the resists, and demonstrated 55nm transferred patterns with high aspect ratios using 2-beam interferometer exposure. In this paper, we have demonstrated smaller-than- 60nm transferred patterns with a high numerical aperture (NA) scanner, as well as 45nm and 40nm transferred patterns with a 2-beam system using a 20% Si-containing thin bilayer resist. Immersion scanner exposure and a 35nm CD with 2- beam system were also studied.

Citation Download Citation

Yoshi Hishiro and Michael Hyatt "Thin bilayer resists for 193-nm and future photolithography II", Proc. SPIE 6519, Advances in Resist Materials and Processing Technology XXIV, 651935 (23 March 2007); https://doi.org/10.1117/12.712737

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available