Simulation of EUV spectral emission from laser-produced tin-doped water plasmas

Pamela R. Woodruff; Joseph J. MacFarlane; Igor E. Golovkin; Ping Wang

doi:10.1117/12.712217

21 March 2007 Simulation of EUV spectral emission from laser-produced tin-doped water plasmas

Pamela R. Woodruff, Joseph J. MacFarlane, Igor E. Golovkin, Ping Wang

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65173N (2007) https://doi.org/10.1117/12.712217
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

Tin-based laser-produced plasmas are attractive candidates as extreme ultraviolet light (EUV) sources for lithography. The accurate simulation of the dynamics and spectral properties of plasmas used in radiation source experiments plays a crucial role in analyzing and interpreting experimental measurements, and in optimizing the 13.5 nm radiation from the plasma source. We use HELIOS-CR, a 1-D radiation-magnetohydrodynamics code, along with a detailed and comprehensive atomic database for tin, to simulate the properties and EUV emission from a plasma produced by the interaction of 1.06 μm laser light and a tin-doped water droplet. Simulated spectra are shown to be in good agreement with experimental results at a variety of laser intensities. Simulation results are also presented to examine the ionization distribution for tin at the simulated temperatures and densities.

Citation Download Citation

Pamela R. Woodruff, Joseph J. MacFarlane, Igor E. Golovkin, and Ping Wang "Simulation of EUV spectral emission from laser-produced tin-doped water plasmas", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65173N (21 March 2007); https://doi.org/10.1117/12.712217

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