Photonic band-gap masks to enhance resolution and depth of focus

John Nistler; Koby Duckworth; Jiri Chaloupka; Matt Brock

doi:10.1117/12.712295

19 March 2007 Photonic band-gap masks to enhance resolution and depth of focus

John Nistler, Koby Duckworth, Jiri Chaloupka, Matt Brock

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 65171F (2007) https://doi.org/10.1117/12.712295
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

The authors introduce initial simulation work on Photonic Bandgap Enhanced or PBE reticles that tends to address the manufacturing problems associated with typical PSM reticles while improving potential resolution capabilities to 35 and 25 nm utilizing 193 nm immersion lithography. The proposed approach for manufacturing reduces the overall defect issues associated with PSM approaches.

Citation Download Citation

John Nistler, Koby Duckworth, Jiri Chaloupka, and Matt Brock "Photonic band-gap masks to enhance resolution and depth of focus", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 65171F (19 March 2007); https://doi.org/10.1117/12.712295

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