Stage position measurement for e-beam lithography tool

Paul G. Harris; William Lee; Andrew W. McClelland; John M. Tingay

doi:10.1117/12.711452

15 March 2007 Stage position measurement for e-beam lithography tool

Paul G. Harris, William Lee, Andrew W. McClelland, John M. Tingay

Proceedings Volume 6517, Emerging Lithographic Technologies XI; 651710 (2007) https://doi.org/10.1117/12.711452
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

With an evident requirement for Gaussian electron beam direct write lithography for prototyping and development on 300mm substrates below the 32nm node Vistec Lithography began the development of a new tool. A key requirement of this tool development was the integration and use of an interferometry solution for stage position measurement. Existing products had shown limitations in their practical application and performance and a new solution sought by the design team. Vistec entered into a development programme with Renishaw to utilise their newly developed interferometry systems.

Citation Download Citation

Paul G. Harris, William Lee, Andrew W. McClelland, and John M. Tingay "Stage position measurement for e-beam lithography tool", Proc. SPIE 6517, Emerging Lithographic Technologies XI, 651710 (15 March 2007); https://doi.org/10.1117/12.711452

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