Paper
20 October 2006 Introduction of a die-to-database verification tool for mask geometry NGR4000
Michael J. Hoffman, Tadashi Kitamura, Kazufumi Kubota, Toshiaki Hasebe, Shinichi Nakazawa, Toshifumi Tokumoto, Masatoshi Tsuneoka, Masahiro Yamamoto, Masahiro Inoue
Author Affiliations +
Abstract
The NGR4000 enables high precision verification of mask features, by matching Scanning Electron Microscope (SEM) images of the mask features to their intended mask design data. The system detects defects in Critical Dimensions (CDs) and feature placement relative to the large Field of View (FOV). This tool is optimized to determine pattern fidelity and perform CD measurements with repeatability well ahead of ITRS roadmap requirements. This paper will show examples and describe the advantages of mass CD measurements, and relative feature placement accuracy as new technique to define pattern fidelity.
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michael J. Hoffman, Tadashi Kitamura, Kazufumi Kubota, Toshiaki Hasebe, Shinichi Nakazawa, Toshifumi Tokumoto, Masatoshi Tsuneoka, Masahiro Yamamoto, and Masahiro Inoue "Introduction of a die-to-database verification tool for mask geometry NGR4000", Proc. SPIE 6349, Photomask Technology 2006, 634940 (20 October 2006); https://doi.org/10.1117/12.684984
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KEYWORDS
Photomasks

Scanning electron microscopy

Critical dimension metrology

Distortion

Inspection

Metrology

Optical proximity correction

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