Pore size control of alumina membrane mask

Yung-Chiang Ting; Shyi-Long Shy

doi:10.1117/12.681837

20 May 2006 Pore size control of alumina membrane mask

Yung-Chiang Ting, Shyi-Long Shy

Proceedings Volume 6283, Photomask and Next-Generation Lithography Mask Technology XIII; 62833I (2006) https://doi.org/10.1117/12.681837
Event: Photomask and Next Generation Lithography Mask Technology XIII, 2006, Yokohama, Japan

Abstract

Anodic aluminum oxide (AAO) mask was fabricated by a two-step aluminum anodizing process. Highly ordered through-holes porous anodic alumina film was obtained by oxidation of aluminum in the solution of oxalic or sulfuric acid, that were used as electrolytes. AAO mask possess hexagonally ordered porous structures with narrow size distributions of pore diameters and inter-pore space, we can control the dimensions of the AAO structure such as pore diameter, pore length, and pore density by changing the procedures and conditions of the fabrication process. In this paper, we change the etching condition, such as different kinds of etching solution, concentration of etching solution, and etching time. We hope to find out the adequate conditions to get a suitable pore size of AAO mask for different requirement. AAO mask offers a cheaper and easier method to apply to a large area and highly ordered nanostructure, such as nano-dot arrays, and nano-wire arrays with high aspect ratio, which is quite difficult to be formed by using electron beam lithography and track etching technique.

Citation Download Citation

Yung-Chiang Ting and Shyi-Long Shy "Pore size control of alumina membrane mask", Proc. SPIE 6283, Photomask and Next-Generation Lithography Mask Technology XIII, 62833I (20 May 2006); https://doi.org/10.1117/12.681837

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