The nanotech impact on IC processing: near and long term

John N. Randall; Richard Stallcup; Taylor Cavanah

doi:10.1117/12.659558

13 March 2006 The nanotech impact on IC processing: near and long term

John N. Randall, Richard Stallcup, Taylor Cavanah

Proceedings Volume 6156, Design and Process Integration for Microelectronic Manufacturing IV; 615610 (2006) https://doi.org/10.1117/12.659558
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Nanotechnology can be seen to already have an impact on IC processing, no matter how it is defined. Nanomanipulators can be used for a variety of tasks in investigating nanostructures. An emerging application is the probing of individual transistors at the contact level anywhere on a die. As downscaling continues its inexorable march with the increasingly strong optical and other processing proximity effects, the ability to collect IV data from individual transistors anywhere in the circuit is becoming a valuable tool for failure analysis, yield enhancement, reliability, process integration, and time to market. The talk will discuss current capabilities and a roadmap to improve the productivity and capabilities of nanoprobing technology. In the longer term, nanotechnology's impact will not be on characterization and testing, but on processing itself. The real promise of nanotechnology is unprecedented process control of all phases of fabrication. An approach to atomically precise manufacturing will be presented that could enable the fabrication of Si or Si/Ge devices where dopant atoms can be precisely placed and the dimensions and control of those dimensions are limited only by the crystal lattice and its reconstruction due to surface or lattice strain. This fabrication technology could be used to produce ultra-scaled CMOS or advanced device technology.

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John N. Randall, Richard Stallcup, and Taylor Cavanah "The nanotech impact on IC processing: near and long term", Proc. SPIE 6156, Design and Process Integration for Microelectronic Manufacturing IV, 615610 (13 March 2006); https://doi.org/10.1117/12.659558

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KEYWORDS

Silicon

Nanotechnology

Focus stacking software

Electron beam lithography

Germanium

Manufacturing

Optical lithography

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