Fractal model applied wavefront aberration for the expression of local flare

Toshiharu Nakashima; Taro Ogata

doi:10.1117/12.656080

20 March 2006 Fractal model applied wavefront aberration for the expression of local flare

Toshiharu Nakashima, Taro Ogata

Proceedings Volume 6154, Optical Microlithography XIX; 615433 (2006) https://doi.org/10.1117/12.656080
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Various inputs representing exposure tool will be required for the advanced OPC in the future. Among them, local flare is difficult to account in OPC because of difficulty to make accurate model it and incorporate it in imaging simulations. In this paper we introduce a method to input the local flare in the simulations. It applies fractal model to the PSD of wavefront aberration, and it generates a model wavefront expressing local flare. This model wavefront is consistent with the disappearing pad experiments. The impact of local flare on the OPC is estimated by the imaging simulation involving the generated model wavefront.

Citation Download Citation

Toshiharu Nakashima and Taro Ogata "Fractal model applied wavefront aberration for the expression of local flare", Proc. SPIE 6154, Optical Microlithography XIX, 615433 (20 March 2006); https://doi.org/10.1117/12.656080

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