GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Satoshi Tanaka; Hiroaki Tsushima; Takanori Nakaike; Taku Yamazaki; Takashi Saito; Hitoshi Tomaru; Koji Kakizaki; Takashi Matsunaga; Toru Suzuki; Osamu Wakabayashi; Shinji Nagai; Junichi Fujimoto; Toyoharu Inoue; Hakaru Mizoguchi

doi:10.1117/12.655474

15 March 2006 GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography

Satoshi Tanaka, Hiroaki Tsushima, Takanori Nakaike, Taku Yamazaki, Takashi Saito, Hitoshi Tomaru, Koji Kakizaki, Takashi Matsunaga, Toru Suzuki, Osamu Wakabayashi, Shinji Nagai, Junichi Fujimoto, Toyoharu Inoue, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 6154, Optical Microlithography XIX; 61542O (2006) https://doi.org/10.1117/12.655474
Event: SPIE 31st International Symposium on Advanced Lithography, 2006, San Jose, California, United States

Abstract

Last year Gigaphoton introduced a 45-W ArF excimer laser, model GT40A, to semiconductor markets as a light source for 65 nm lithography generation. The GT40A is based on injection lock technology with G-electrode, magnetic bearing and high resolution technologies for high reliability and long lifetime. As a result, GT40A showed the stable performance during the chamber maintenance interval of over 15 billion pulses. In this paper we will report the longterm stability of GT40A.

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Satoshi Tanaka, Hiroaki Tsushima, Takanori Nakaike, Taku Yamazaki, Takashi Saito, Hitoshi Tomaru, Koji Kakizaki, Takashi Matsunaga, Toru Suzuki, Osamu Wakabayashi, Shinji Nagai, Junichi Fujimoto, Toyoharu Inoue, and Hakaru Mizoguchi "GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography", Proc. SPIE 6154, Optical Microlithography XIX, 61542O (15 March 2006); https://doi.org/10.1117/12.655474

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