Application of the unified mask data format based on OASIS for VSB EB writers

Toshio Suzuki; Junji Hirumi; Osamu Suga

doi:10.1117/12.638800

9 November 2005 Application of the unified mask data format based on OASIS for VSB EB writers

Toshio Suzuki, Junji Hirumi, Osamu Suga

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59924F (2005) https://doi.org/10.1117/12.638800
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

Mask data preparation (MDP) for modern mask manufacturing becomes a complex process because many kinds of EB data formats are used in mask makers and EB data files continue to become bigger by the application of RET. Therefore we developed a unified mask pattern data format named "OASIS.VSB¹" and a job deck format named "MALY²" for Variable-Shaped-Beam (VSB) EB writers. OASIS.VSB is the mask pattern data format based on OASIS^{TM 3} (Open Artwork System Interchange Standard) released as a successive format to GDSII by SEMI. We defined restrictions on OASIS for VSB EB writers to input OASIS.VSB data directly to VSB EB writers just like the native EB data. OASIS.VSB specification and MALY specification have been disclosed to the public and will become a SEMI standard in the near future. We started to promote the spread activities of OASIS.VSB and MALY. For practical use of OASIS.VSB and MALY, we are discussing the infrastructure system of MDP processing using OASIS.VSB and MALY with mask makers, VSB EB makers, and device makers. We are also discussing the tools for the infrastructure system with EDA vendors. The infrastructure system will enable TAT, the man-hour, and the cost in MDP to be reduced. In this paper, we propose the plan of the infrastructure system of MDP processing using OASIS.VSB and MALY as an application of OASIS.VSB and MALY.

Citation Download Citation

Toshio Suzuki, Junji Hirumi, and Osamu Suga "Application of the unified mask data format based on OASIS for VSB EB writers", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59924F (9 November 2005); https://doi.org/10.1117/12.638800

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KEYWORDS

Vestigial sideband modulation

Data conversion

Photomasks

Electronic design automation

Resolution enhancement technologies

Inspection

Manufacturing

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