Paper
7 August 2013 Correlation between structural properties and stability of pentacene field effect transistors with a polymer / high-k oxide two layer gate dielectric
A.-L. Deman, M. Erouel, D. Lallemand, M. Phaner-Goutorbe, P. Lang, J. Tardy
Author Affiliations +
Abstract
In this work, we report on the study of pentacene field effect transistors with a polymer (PMMA) on a high-k oxide (Ta2O5) two-layer gate dielectric, in order to combine low voltage operating devices and stability. Two-layer dielectric devices were compared to single layer (Ta2O5 or PMMA) gate insulators. To assess the importance of the structural quality of the Ta2O5, two deposition processes (e-beam evaporation and anodization) are studied. In order to evidence the relation between the electrical performances and behavior and the structural quality of the organic thin film, X-ray diffraction and AFM measurements were carried out to determine the pentacene morphology and ordering on the different dielectrics. Devices with bilayer gate dielectric present the best mobility, up to 0,6cm²/V/s, the pentacene film being well ordered in large grains on PMMA with or without high-k under layer. The transistors operate at 15V and show reduced polarisation effect compared to devices with only Ta2O5.
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A.-L. Deman, M. Erouel, D. Lallemand, M. Phaner-Goutorbe, P. Lang, and J. Tardy "Correlation between structural properties and stability of pentacene field effect transistors with a polymer / high-k oxide two layer gate dielectric", Proc. SPIE 5940, Organic Field-Effect Transistors IV, 59400E (7 August 2013); https://doi.org/10.1117/12.614968
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KEYWORDS
Tantalum

Dielectrics

Polymethylmethacrylate

Field effect transistors

Oxides

Polymers

Atomic force microscopy

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