High-performance large-area ultra-broadband (UV to IR) nanowire-grid polarizers and polarizing beam-splitters

Jian Wang; Paul Sciortino; Feng Liu; Ping Yuan; Xuegong Deng; Frank Walters; Xiaoming Liu; Joel Bacon; Lei Chen

doi:10.1117/12.617898

27 August 2005 High-performance large-area ultra-broadband (UV to IR) nanowire-grid polarizers and polarizing beam-splitters

Jian Wang, Paul Sciortino, Feng Liu, Ping Yuan, Xuegong Deng, Frank Walters, Xiaoming Liu, Joel Bacon, Lei Chen

Author Affiliations +

Proceedings Volume 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II; 59310D (2005) https://doi.org/10.1117/12.617898
Event: Optics and Photonics 2005, 2005, San Diego, California, United States

Abstract

Aluminum nanowire-grid polarizers and polarizing beam splitters with a fixed pitch (i.e., period) of ~146 nm but a wide range of linewidths (from < 60 nm to 90 nm) and heights (from 150 nm to 200 nm) are studied. Immersion interference lithography, UV-nanoimprint lithography and aluminum reactive ion etching were used to fabricate the nanowire-grid polarizers. Optical performance of the nanowire-grid polarizers was characterized in a broad spectral range from UV (< 400 nm) to near infrared (> 1700 nm). The performance trade-off between transmittance/reflectance and extinction ratio is investigated in details. The developed high-performance large-area broadband nanowire-grid polarizer opens the potential for many optical applications particularly integrated optics.

Citation Download Citation

Jian Wang, Paul Sciortino, Feng Liu, Ping Yuan, Xuegong Deng, Frank Walters, Xiaoming Liu, Joel Bacon, and Lei Chen "High-performance large-area ultra-broadband (UV to IR) nanowire-grid polarizers and polarizing beam-splitters", Proc. SPIE 5931, Nanoengineering: Fabrication, Properties, Optics, and Devices II, 59310D (27 August 2005); https://doi.org/10.1117/12.617898

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