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Fabrication of surface-micromachined structures by a post-processing module above standard IC circuits is an efficient way to produce monolithic microsystems, allowing nearly independent optimization of the circuitry and the MEMS process. However, until now the high-temperature steps needed for deposition of poly-Si have limited its application. SiGeM explores the possibilities offered by the low-temperature (450°C) deposition and structuring of poly-SiGe layers, which is compatible with the temperature budget of fully-processed standard IC wafers. In the SiGeM project several low-temperature deposition methods (CVD, PECVD, LPCVD) were developed, and were evaluated with respect to growth rate and material quality. The interconnection technology to the underlying CMOS circuitry was also developed. The capabilities of this new integration technology will be demonstrated in a monolithic high-performance rate-of-turn sensor, currently considered the most demanding MEMs application in terms of material properties of the structural layer (thickness > 10mm, stress gradient < 0.3MPa/mm) and signal processing circuitry (capacitance resolution in the aF range, SNR > 110 dB). System partitioning will combine analog and DSP circuit techniques to maximize resolution and stability. Parasitic electrical coupling within different parts of the system has been analyzed, and countermeasures to reduce it have been incorporated in the design. The feasibility of the approach has already been proved by preliminary characterization of working prototypes containing released microstructures deposited on top of preamplifier circuits built on a 0.35mm, 5-metal, 2-poly, standard CMOS process from Philips Semiconductors. Resonance frequencies are in good agreement with predictions, and quality factors above 8000 have been obtained at pressures of 0.8 mTorr. Measured SNR confirms the capability to achieve a resolution of 0.015°/s over a bandwidth of 50 Hz.
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