Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns

Jangho Shin; SukJoo Lee; Hochul Kim; Chan Hwang; SeongSue Kim; Sang-Gyun Woo; Han-Ku Cho; Joo-Tae Moon

doi:10.1117/12.598655

12 May 2005 Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns

Jangho Shin, SukJoo Lee, Hochul Kim, Chan Hwang, SeongSue Kim, Sang-Gyun Woo, Han-Ku Cho, Joo-Tae Moon

Author Affiliations +

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.598655
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Various pupil-fill measurement techniques are evaluated to monitor non-telecentricity of an illuminator as followings: transmission image sensor (TIS) of ASML, source metrology instrument (SMI) of Litel, Fresnel zone plate (FZP) of Philips, and non-telecentricity measurement technique using traditional overlay marks, which is based on an idea that pattern shift is proportional to the amount of defocus. Based on aerial image simulation with measured non-telecentricity, its effect on sub-70 nm device patterning is discussed. Experimental data shows that some of pupil-fills appear more than 70 milli-radian of source displacement error and it may cause serious pattern shift and/or asymmetry. Detailed descriptions of measurement techniques and experimental results are presented.

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Jangho Shin, SukJoo Lee, Hochul Kim, Chan Hwang, SeongSue Kim, Sang-Gyun Woo, Han-Ku Cho, and Joo-Tae Moon "Measurement technique of nontelecentricity of pupil-fill and its application to 60 nm NAND flash memory patterns", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.598655

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