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6 May 2005 Nikon EPL tool: the latest development status and results
Takaharu Miura, Shintaro Kawata, Kazunari Hada, Yukio Kakizaki, Masaya Miyazaki, Kazuaki Suzuki, Noriyuki Hirayanagi, Atsushi Yamada, Junji Ikeda, Takehisa Yahiro, Jin Udagawa, Hidekazu Takekoshi, Takaaki Umemoto, Yukiharu Ohkubo, Toshimasa Shimoda, Toru Tanida, Yoichi Watanabe, Kaoru Ohmori, Futoshi Mori, Shigeru Takemoto, Takeshi Yoshioka, Kenji Morita
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Proceedings Volume 5751, Emerging Lithographic Technologies IX; (2005) https://doi.org/10.1117/12.598687
Event: Microlithography 2005, 2005, San Jose, California, United States
Abstract
Electron Projection Lithography (EPL) is considered one of promising technologies below 45nm node, especially for contact/via holes and gate layers. EPL has some nice features such as very high resolution to be applied for two device nodes, large process margin associated with large depth of focus and an expected lower CoO. Nikon has been developing an EPL tool, so-called EB Stepper. NSR-EB1A is the first EB Stepper that was designed as R&D tool for 65nm technology node and that was already delivered for Selete (Semiconductor Leading Edge Technologies, Inc.) at Tsukuba in Japan. Nikon has developed two NSR-EB1A tools so far, one system for Selete as a 300mm wafer system and the other for Nikon's development and evaluation as a 200mm wafer system. Both tools have already started to show full performance data and good stability characteristics. The latest EB1A tool performance shows very good results in such data as the resolution of 50nm 2:1 L/S and 60nm 1:1 dense contact holes patterns, stitching accuracy of around 18nm, and overlay accuracy of around 20nm(X+3sigma).
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Takaharu Miura, Shintaro Kawata, Kazunari Hada, Yukio Kakizaki, Masaya Miyazaki, Kazuaki Suzuki, Noriyuki Hirayanagi, Atsushi Yamada, Junji Ikeda, Takehisa Yahiro, Jin Udagawa, Hidekazu Takekoshi, Takaaki Umemoto, Yukiharu Ohkubo, Toshimasa Shimoda, Toru Tanida, Yoichi Watanabe, Kaoru Ohmori, Futoshi Mori, Shigeru Takemoto, Takeshi Yoshioka, and Kenji Morita "Nikon EPL tool: the latest development status and results", Proc. SPIE 5751, Emerging Lithographic Technologies IX, (6 May 2005); https://doi.org/10.1117/12.598687
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KEYWORDS
Semiconducting wafers
Reticles
Electron beams
Wafer-level optics
Control systems
Electron beam lithography
Photomasks
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